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Investigation of LOCOS- and Polysilicon-Bound Diodes for Robust Electrostatic Discharge (ESD) Applications

机译:适用于鲁棒静电放电(ESD)应用的LOCOS和多晶硅绑定二极管的研究

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摘要

In this paper, the current-carrying and voltage-clamping capabilities of LOCal Oxidation of Silicon (LOCOS)- and polysilicon-bound diodes are first investigated. Comparison of these capabilities leads to the conclusion that the polysilicon-bound diode is more suited for electrostatic discharge (ESD) protection applications. Then, to achieve an optimal diode structure for ESD applications, the effects of the cathode/anode length, cathode/anode width, polysilicon width, finger number, terminal connection, and metal layout on the polysilicon-bound diode's ESD robustness are studied and discussed in detail.
机译:本文首先研究了硅的LOCal氧化(LOCOS)和与多晶硅结合的二极管的载流和钳位电压能力。比较这些功能可以得出结论,与多晶硅绑定的二极管更适合于静电放电(ESD)保护应用。然后,为了获得用于ESD应用的最佳二极管结构,研究并讨论了阴极/阳极长度,阴极/阳极宽度,多晶硅宽度,指状数,端子连接和金属布局对多晶硅约束二极管的ESD鲁棒性的影响。详细。

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