首页> 外文期刊>Electron Devices, IEEE Transactions on >$hbox{Al}_{y}hbox{Ga}_{1-y}hbox{N/Al}_{x} hbox{Ga}_{1-x}hbox{N/GaN}$ Double-Heterostructure Detector With Three Ultraviolet Spectral Band Responses
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$hbox{Al}_{y}hbox{Ga}_{1-y}hbox{N/Al}_{x} hbox{Ga}_{1-x}hbox{N/GaN}$ Double-Heterostructure Detector With Three Ultraviolet Spectral Band Responses

机译:$ hbox {Al} _ {y} hbox {Ga} _ {1-y} hbox {N / Al} _ {x} hbox {Ga} _ {1-x} hbox {N / GaN} $双异质结构检测器具有三个紫外线光谱带响应

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In this paper, an $hbox{Al}_{y}hbox{Ga}_{1-y}hbox{N/Al}_{x} hbox{Ga}_{1-x}hbox{N/GaN}break (y > x)$ double-heterostructure (DH) p-p-i-n ultraviolet (UV) detector is designed based on the influence of the polarization effect on the AlGaN/GaN heterostructure. The influences of doping concentration and Al composition in AlGaN on the photoelectric response of the UV detector are calculated and discussed by selfconsistent solving of the Schrödinger–Poisson equation and solving the carriers'' continuity equation. The calculation results show that the $ hbox{Al}_{y}hbox{Ga}_{1-y}hbox{N/Al}_{x}hbox{Ga}_{1-x}hbox{N/GaN}$ DH p-p-i-n UV detector presents a three-UV-response wavelength region with increasing bias voltage, and the three-UV-response wavelength region can be abnormally adjusted from 200 to 365 nm by changing the Al composition in the $hbox{Al}_{y}hbox{Ga}_{1-y}hbox{N}$ and $hbox{Al}_{x}hbox{Ga}_{1-x}hbox{N}$ layers. The calculation results are verified by the Korona''s experimental testing results at the end of this paper.
机译:在本文中,$ hbox {Al} _ {y} hbox {Ga} _ {1-y} hbox {N / Al} _ {x} hbox {Ga} _ {1-x} hbox {N / GaN}基于极化效应对AlGaN / GaN异质结构的影响,设计出了断裂(y> x)$双异质结构(DH)ppin紫外(UV)检测器。通过自洽求解薛定-泊松方程并求解载流子的连续性方程,计算并讨论了AlGaN中掺杂浓度和Al组成对紫外检测器光电响应的影响。计算结果表明,$ hbox {Al} _ {y} hbox {Ga} _ {1-y} hbox {N / Al} _ {x} hbox {Ga} _ {1-x} hbox {N / GaN } $ DH ppin紫外检测器呈现出随偏置电压增加而产生的三个UV响应波长区域,通过更改$ hbox中的Al组成,可以将200个紫外线响应波长区域异常调整为365 nm {Al} _ {y} hbox {Ga} _ {1-y} hbox {N} $和$ hbox {Al} _ {x} hbox {Ga} _ {1-x} hbox {N} $层。本文最后通过Korona的实验测试结果验证了计算结果。

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