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Uniform High-Current Cathodes Using Massive Arrays of Si Field Emitters Individually Controlled by Vertical Si Ungated FETs—Part 1: Device Design and Simulation

机译:使用分别由垂直Si非栅极FET控制的大量Si场发射器阵列的均匀大电流阴极-第1部分:器件设计和仿真

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摘要

In this paper, we report the design and simulation of electron sources composed of arrays of Si field emitters (FEs) that are individually ballasted by a current source. Each FE is fabricated on top of a vertical ungated field-effect transistor (FET), a two-terminal device based on a very-high-aspect-ratio Si column. The ungated FET takes advantage of the velocity saturation of electrons in silicon, the high aspect ratio of the ungated FET, and the doping concentration of the semiconductor to achieve current-source-like behavior. The proposed technology can be used to implement cathodes capable of reliable uniform and high current emission.
机译:在本文中,我们报告了由硅场发射器(FE)阵列组成的电子源的设计和仿真,这些电子场分别由一个电流源镇流。每个FE均制造在垂直非门控场效应晶体管(FET)的顶部,该晶体管是基于极高纵横比的Si柱的两端器件。非门控FET利用硅中电子的速度饱和,非门控FET的高长宽比以及半导体的掺杂浓度来实现类似电流源的行为。所提出的技术可以用于实现能够可靠地均匀且高电流发射的阴极。

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