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Accurate Analytical Physical Modeling of Amorphous InGaZnO Thin-Film Transistors Accounting for Trapped and Free Charges

机译:解释了陷阱电荷和自由电荷的非晶InGaZnO薄膜晶体管的精确分析物理模型

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摘要

A physical-based and analytical drain current model of amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs) is proposed. The model considers the combined contribution of both trapped and free charges that move through the a-IGZO film by multiple-trapping-and-release and percolation in conduction band. The model is compared with both measurements of TFTs fabricated on a flexible substrate and numerical simulations. It is accurate in the whole range of a-IGZO TFTs operation. The model requires only physical and geometrical device parameters. The resulting mathematical expressions are suitable for computer-aided design implementation and yield the material physical parameters that are essential for process characterization.
机译:提出了基于物理和分析的非晶铟镓锌氧化物(a-IGZO)薄膜晶体管(TFT)的漏极电流模型。该模型考虑了通过a-IGZO薄膜移动的俘获电荷和自由电荷在导带中的多次俘获和释放以及渗流的组合贡献。将模型与在柔性基板上制造的TFT的测量结果和数值模拟进行比较。在整个a-IGZO TFT操作范围内,它都是准确的。该模型仅需要物理和几何设备参数。所得的数学表达式适合于计算机辅助设计的实现,并产生对于过程表征必不可少的材料物理参数。

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