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Ga-Doped ZnO Nanosheet Structure-Based Ultraviolet Photodetector by Low-Temperature Aqueous Solution Method

机译:低温水溶液法掺杂Ga的ZnO纳米片结构紫外光电探测器

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摘要

The fabrication of Ga-doped zinc oxide (GZO) nanosheets on a glass substrate was done using the aqueous solution method. A GZO nanosheet metal–semiconductor–metal ultraviolet (UV) photodetector (PD) was also fabricated. The average length and diameter of the GZO nanosheets were 1.28 and nm, respectively. The energy dispersive X-ray spectrum determined that the Ga-doped sample contains % at.%. The UV-to-visible rejection ratio of the sample is when biased at 1 V, and the fabricated UV PD is visible-blind with a sharp cutoff at 370 nm. The photocurrent and dark-current constant ratio of the fabricated PD was 193 when biased at 1 V. The transient time constants measured during the rise time and the fall time were 2.45 and 4 s, respectively.
机译:使用水溶液方法在玻璃基板上制造Ga掺杂的氧化锌(GZO)纳米片。还制造了一个GZO纳米片金属-半导体-金属紫外(UV)光电探测器(PD)。 GZO纳米片的平均长度和直径分别为1.28和nm。能量色散X射线光谱确定Ga掺杂的样品包含%原子%。样品在1 V的偏压下,其UV可见排斥比为,制造的UV PD在370 nm处具有明显的截止波长,并且是可见盲的。当在1 V偏置时,制成的PD的光电流和暗电流恒定比为193。在上升时间和下降时间测量的瞬态时间常数分别为2.45和4 s。

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