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Ultraviolet photodetectors with Ga-doped ZnO nanosheets structure

机译:具有Ga掺杂的ZnO纳米片结构的紫外线光电探测器

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摘要

In this study, Ga-doped ZnO (GZO) nanosheets were grown on a glass substrate by using aqueous solution method. A GZO nanosheet metal-semiconductor-metal (MSM) ultraviolet (UV) photodetector (PD) was also fabricated. The average length and diameter of the GZO nanosheets were 2.06 mu m and approximately 20 nm, respectively. The EDX spectrum determined that the Ga-doped sample contains approximately 1.35% at%. The UV-to-visible rejection ratio of the device is approximately 42 when biased at 1 V, and the fabricated UV PD is visible-blind with a sharp cutoff at 370 nm. The photo-current and dark-current constant ratio of the fabricated PD was approximately 14193 when biased at 1 V. The transient time constants measured during the rise time and fall time were 2.45 s and 4.0 s, respectively. (C) 2015 Elsevier B.V. All rights reserved.
机译:在这项研究中,Ga掺杂的ZnO(GZO)纳米片通过使用水溶液法在玻璃基板上生长。还制造了GZO纳米片金属-半导体-金属(MSM)紫外线(UV)光电探测器(PD)。 GZO纳米片的平均长度和直径分别为2.06μm和约20nm。 EDX光谱确定Ga掺杂的样品包含约1.35原子%。当以1 V偏置时,器件的UV-可见光拒绝比约为42,并且所制造的UV PD是可见盲的,在370 nm处有明显的截止。当以1 V偏置时,制成的PD的光电流和暗电流恒定比约为14193。在上升时间和下降时间测量的瞬态时间常数分别为2.45 s和4.0 s。 (C)2015 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Microelectronic Engineering》 |2015年第1期|14-16|共3页
  • 作者

    Young Sheng-Joue; Liu Yi-Hsing;

  • 作者单位

    Natl Formosa Univ, Dept Elect Engn, Huwei Township 632, Yunlin, Taiwan;

    Natl Formosa Univ, Dept Elect Engn, Huwei Township 632, Yunlin, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Ga-doped ZnO; Photodetector; Metal-semiconductor-metal;

    机译:Ga掺杂ZnO;光电探测器;金属半导体金属;

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