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首页> 外文期刊>Electron Devices, IEEE Transactions on >Research of Single-Event Burnout in Power Planar VDMOSFETs by Localized Carrier Lifetime Control
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Research of Single-Event Burnout in Power Planar VDMOSFETs by Localized Carrier Lifetime Control

机译:基于局部载流子寿命控制的功率平面VDMOSFET单事件烧毁研究

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This paper presents 2-D numerical simulation results of single-event burnout (SEB) in power planar vertical double-diffused MOSFET (VDMOSFET) with localized carrier lifetime control. A low carrier lifetime control region (LCLCR) is introduced to accelerate the recombination rate of the generated holes caused by an ion’s impact. The optimal localized range with LCLCR in epitaxial layer has been investigated. The SEB inhibition mechanism with LCLCR is analyzed and discussed. A VDMOSFET with localized LCLCR can operate like a normal VDMOSFET and can have improved SEB performance effectively. In addition, the leakage current density in breakdown characteristics of VDMOSFET is studied based on the variation of carrier lifetime.
机译:本文介绍了具有局部载流子寿命控制的功率平面垂直双扩散MOSFET(VDMOSFET)中单事件烧坏(SEB)的二维数值模拟结果。引入了一个低载流子寿命控制区(LCLCR),以加速由离子的撞击而产生的空穴的复合速率。研究了LCLCR在外延层中的最佳局部范围。分析并讨论了具有LCLCR的SEB抑制机制。具有局部LCLCR的VDMOSFET可以像普通VDMOSFET一样工作,并且可以有效地提高SEB性能。此外,基于载流子寿命的变化,研究了VDMOSFET击穿特性中的漏电流密度。

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