机译:宽带隙和超空手隙CMOS器件的前景
Cornell Univ Sch Appl & Engn Phys AEP Ithaca NY 14853 USA|Intel Corp Hillsboro OR 97124 USA;
Cornell Univ Sch Elect & Comp Engn ECE Ithaca NY 14853 USA;
Cornell Univ Sch Elect & Comp Engn ECE Ithaca NY 14853 USA;
Cornell Univ Sch Elect & Comp Engn ECE Ithaca NY 14853 USA;
Cornell Univ Sch Elect & Comp Engn ECE Ithaca NY 14853 USA;
Cornell Univ Sch Elect & Comp Engn ECE Ithaca NY 14853 USA;
Cornell Univ Sch Elect & Comp Engn ECE Ithaca NY 14853 USA|Cornell Univ Dept Mat Sci & Engn MSE Ithaca NY 14853 USA|Cornell Univ Kavli Inst Cornell Nanoscale Sci KIC Ithaca NY 14853 USA;
Cornell Univ Sch Elect & Comp Engn ECE Ithaca NY 14853 USA|Cornell Univ Dept Mat Sci & Engn MSE Ithaca NY 14853 USA|Cornell Univ Kavli Inst Cornell Nanoscale Sci KIC Ithaca NY 14853 USA;
Intel Corp Hillsboro OR 97124 USA;
MIT Dept Elect Engn & Comp Sci EECS 77 Massachusetts Ave Cambridge MA 02139 USA;
MIT Dept Elect Engn & Comp Sci EECS 77 Massachusetts Ave Cambridge MA 02139 USA;
Silicon carbide; Photonic band gap; Silicon; MOS devices; Gallium nitride; Logic gates; Diamond; AlN; complementary metal-oxide-semiconductor-based design (CMOS); diamond; GaN; SiC; wide bandgap;
机译:次世代的电力电子产品:超宽带隙器件,高温封装和磁性纳米复合材料
机译:基于宽带隙半导体作为潜在太赫兹源的IMPATT器件的前景
机译:电动汽车/混合动力汽车中电子学的现状和未来展望以及对带隙半导体器件的期望
机译:(邀请)超法带隙β-GA_2O_3薄膜:生长,性能和装置
机译:基于宽/超宽带隙半导体的先进电子设备
机译:超透压带隙和高灵敏度的等离子体金属 - 绝缘子 - 金属波导过滤器具有空腔和挡板
机译:宽带隙和超空手隙半导体的等离子体蚀刻
机译:Ultrawide-Bandgap semiconductors:研究机遇与挑战。