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Optimal Ferroelectric Parameters for Negative Capacitance Field-Effect Transistors Based on Full-Chip Implementations—Part II: Scaling of the Supply Voltage

机译:基于全芯片实现的负电容场效应晶体管的最佳铁电参数 - 第二部分:电源电压的缩放

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Negative capacitance field-effect transistors (NCFETs) with optimal ferroelectric parameters provide phenomenal power reduction as discussed in Part I. In this part, we explore the impact of operating voltage on power consumption at the device, gate, and full-chip levels. We first observe that high operating voltages applied to NCFET devices lead to an abrupt increase in both the drain current and the gate capacitance. Furthermore, negative capacitance is lost when the voltage is set too high. On the other hand, the gate capacitance increase still exists, although with smaller magnitude, even at low operating voltages. This helps reduce device delay and eventually full-chip delay. Furthermore, delay improvement at the full-chip level can be traded off to gain power reduction at the full-chip level. Finally, our experiments suggest that a sufficiently low supply voltage ( 0.4 V out of [0.2 and 0.8 V] range in our study) is needed to maximize power and performance gain at full-chip level.
机译:具有最佳铁电参数的负电容场效应晶体管(NCFET)提供了如第一部分所讨论的现象功率降低。在本部分中,我们探讨了工作电压对设备,门和全芯片水平的功耗的影响。我们首先观察到施加到NCFET器件的高工作电压导致漏极电流和栅极电容的突然增加。此外,当电压设置得太高时,负电容丢失。另一方面,栅极电容增加仍然存在,尽管较小的幅度,即使在低操作电压下也是如此。这有助于降低设备延迟和最终的全芯片延迟。此外,可以在全芯片级别进行延迟改善以在全芯片级别降低功耗。最后,我们的实验表明,需要足够低的电源电压(我们研究中的0.4和0.8 V]范围的0.4V),以最大化全芯片水平的功率和性能增益。

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