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首页> 外文期刊>IEEE Transactions on Electron Devices >Study on High-Density Integration Resistive Random Access Memory Array From Multiphysics Perspective by Parallel Computing
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Study on High-Density Integration Resistive Random Access Memory Array From Multiphysics Perspective by Parallel Computing

机译:多物理场并行计算研究高密度集成电阻随机存取存储器阵列

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摘要

A finite-element method-based parallel computing simulator for multiphysics effects in resistive random access memory (RRAM) array, which is suitable for supercomputer platforms even with thousands of cores, is developed to simulate oxygen vacancy migration, current transport, and thermal conduction. Exponentially fit flux Galerkin method is introduced to improve algorithm convergence when solving the 3-D oxygen vacancy drift-diffusion equation. The accuracy of our algorithm is validated by comparison with commercial software. Scalability of our parallel algorithm is also investigated. The simulation results for the high-density integration RRAM array indicate that the heat generated during the writing process can result in high temperature, and lead to severe reliability problem. Even the RRAM cells without bias voltage applied can be transferred from low-resistance state to high-resistance state unintentionally, and lose their stored information. Increasing the feature size or equivalently decreasing the integration density lowers the power density, hence improves reliability performance. Large electrode thickness with Dirichlet boundary applied on their side surfaces can drain out heat faster and enhance reliability of RRAM array.
机译:开发了一种基于有限元方法的并行计算仿真器,用于模拟电阻随机存取存储器(RRAM)阵列中的多物理场效应,该仿真器甚至适用于具有数千个核的超级计算机平台,以模拟氧空位迁移,电流传输和热传导。为了解决3-D氧空位漂移扩散方程,引入了指数拟合通量Galerkin方法,以提高算法的收敛性。通过与商业软件进行比较,验证了我们算法的准确性。还研究了我们并行算法的可伸缩性。高密度集成RRAM阵列的仿真结果表明,写入过程中产生的热量会导致高温,并导致严重的可靠性问题。即使没有施加偏置电压的RRAM单元也可能无意地从低电阻状态转移到高电阻状态,并丢失其存储的信息。增加特征尺寸或等效地降低积分密度会降低功率密度,从而提高可靠性。侧面带有Dirichlet边界的大电极厚度可以更快地散热,并提高RRAM阵列的可靠性。

著录项

  • 来源
    《IEEE Transactions on Electron Devices》 |2019年第4期|1747-1753|共7页
  • 作者单位

    Zhejiang Univ, Key Lab Adv Micronano Elect Devices & Smart Syst, Innovat Inst Electromagnet Informat & Elect Integ, Coll Informat Sci & Elect Engn, Hangzhou 310058, Zhejiang, Peoples R China;

    Zhejiang Univ, Key Lab Adv Micronano Elect Devices & Smart Syst, Innovat Inst Electromagnet Informat & Elect Integ, Coll Informat Sci & Elect Engn, Hangzhou 310058, Zhejiang, Peoples R China|ZJU UIUC Inst, Coll Informat Sci & Elect Engn, Int Campus, Haining 314400, Peoples R China;

    Zhejiang Univ, Key Lab Adv Micronano Elect Devices & Smart Syst, Innovat Inst Electromagnet Informat & Elect Integ, Coll Informat Sci & Elect Engn, Hangzhou 310058, Zhejiang, Peoples R China;

    Zhejiang Univ, Key Lab Adv Micronano Elect Devices & Smart Syst, Innovat Inst Electromagnet Informat & Elect Integ, Coll Informat Sci & Elect Engn, Hangzhou 310058, Zhejiang, Peoples R China;

    Inst Appl Phys & Computat Math, Beijing 100088, Peoples R China;

    Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China;

    UIUC, Dept Elect & Comp Engn, Urbana, IL 61801 USA;

    Zhejiang Univ, Key Lab Adv Micronano Elect Devices & Smart Syst, Innovat Inst Electromagnet Informat & Elect Integ, Coll Informat Sci & Elect Engn, Hangzhou 310058, Zhejiang, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Drift diffusion; finite-element method (FEM); heat conduction; parallel computing; reliability; resistive random access memory (RRAM) array;

    机译:漂移扩散;有限元方法(FEM);导热;并行计算;可靠性;电阻随机存取存储器(RRAM)阵列;

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