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A Snapback-Free and Low-Loss Shorted-Anode SOI LIGBT With Self-Adaptive Resistance

机译:具有自适应电阻的无回弹,低损耗的短阳极SOI LIGBT

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摘要

A novel 600-V snapback-free and low-loss shorted-anode (SA) silicon on insulator lateral insulated gate bipolar transistor (LIGBT) with self-adaptive resistance (SAR) in anode is proposed and investigated by simulation, named SAR LIGBT. The device is characterized by dual anode trenches which are filled with p-type polysilicon and surrounded by oxide, and the dual trenches are shorted with the anode electrode, separated by the low-doped N-region and N+ anode region. At low anode voltage (V-A), the N- region is fully depleted by p-type polysilicon, serving as a large resistance to hinder electrons flowing into the N+ anode; at high VA, an electron accumulation layer is formed along the anode trenches to provide a low-resistance path for electron current. Consequently, N-region makes the distributed resistances at the anode side (RSA) act as a SAR. It not only eliminates the snapback effect but also reduces on-state voltage drop (V-ON) and turn-off energy loss (E-OFF). Therefore, SAR LIGBT achieves a better tradeoff between V-ON and E-OFF. At the same V-ON, the SAR LIGBT reduces the E-OFF by 20.6%, 28.1%, and 30.5% compared with those of multisegment anode, segmented trenches in the anode, and SA-NPN LIGBTs, respectively. Moreover, the SAR LIGBT exhibits the lowest V-ON of 1.71 V and the shortest switching time of 93 ns at J(A) = 100 A/cm(2). In addition, the SAR LIGBT achieves snapback-free with smaller cell pitch than that of separated SA LIGBT.
机译:提出并通过仿真研究了一种新型的绝缘体横向绝缘栅双极型晶体管(LIGBT)上具有自适应电阻(SAR)的600V无骤回和低损耗短阳极(SA)硅,称为SAR LIGBT。该器件的特征在于,双阳极沟槽填充有p型多晶硅并被氧化物包围,并且双沟槽与阳极电极短路,被低掺杂N区域和N +阳极区域隔开。在低阳极电压(V-A)下,p型多晶硅会完全耗尽N-区域,这是阻止电子流入N +阳极的大电阻。在高VA时,沿着阳极沟槽形成电子累积层,以为电子电流提供低电阻路径。因此,N区域使阳极侧的分布电阻(RSA)充当SAR。它不仅消除了回跳效应,还降低了导通状态压降(V-ON)和关断能量损耗(E-OFF)。因此,SAR LIGBT在V-ON和E-OFF之间实现了更好的权衡。在相同的V-ON下,与多段阳极,阳极中的分段沟槽和SA-NPN LIGBT相比,SAR LIGBT分别将E-OFF降低了20.6%,28.1%和30.5%。此外,在J(A)= 100 A / cm(2)时,SAR LIGBT的V-ON最低,为1.71 V,最短开关时间为93 ns。此外,与分离的SA LIGBT相比,SAR LIGBT的单元间距更小,实现了无回跳。

著录项

  • 来源
    《IEEE Transactions on Electron Devices》 |2019年第3期|1390-1395|共6页
  • 作者单位

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China|China Elect Technol Grp Corp, Res Inst, Chongqing 400060, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Low-loss; p-type polysilicon; self-adaptive resistance (SAR); shorted-anode (SA); snapback-free; silicon on insulator lateral insulated gate bipolar transistor (SOI LIGBT);

    机译:低损耗;p型多晶硅;自适应电阻(SAR);阳极短接(SA);无回跳;绝缘体横向绝缘栅双极型晶体管(SOI LIGBT)上的硅;

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