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Device Instability of ReRAM and a Novel Reference Cell Design for Wide Temperature Range Operation

机译:ReRAM的器件不稳定性和适用于宽温度范围操作的新型参考单元设计

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摘要

This letter addresses two difficult challenges for transition metal oxide resistive random access memories (ReRAMs)—sensitivity to operation temperature and random fluctuation of resistance value. A careful study of a WO ReRAM array reveals that these devices are unstable and their read currents fluctuate with time due to random telegraph noise and structure relaxation. Consequently, even after careful programming, the current distribution can broaden with time and tail bit population grows. Furthermore, ReRAM state is sensitive to temperature and a reference cell made of the same device material must be used. Thus, although the broadening of read current distribution may be tolerated by creating a larger RESET/SET memory window, the current fluctuation still makes it impossible to predict the output of the reference cell, leading to array malfunction. This letter investigates the current (resistance) instability in detail and proposes a reference array with a novel trimming method that can stabilize the reference current level. The proposed reference array has very good dc stress reliability as well as wide-range temperature tracking performance from −40 °C to 85 °C.
机译:这封信解决了过渡金属氧化物电阻随机存取存储器(ReRAM)的两个难题:对工作温度的敏感性和电阻值的随机波动。对WO ReRAM阵列的仔细研究表明,由于随机电报噪声和结构松弛,这些设备不稳定,并且读取电流会随时间波动。因此,即使经过仔细的编程,电流分布也会随着时间的增长而变宽,并且尾部钻头的数量也会增加。此外,ReRAM状态对温度敏感,必须使用由相同器件材料制成的参考单元。因此,尽管可以通过创建更大的RESET / SET存储器窗口来容忍读取电流分布的变宽,但是电流波动仍然使得无法预测参考单元的输出,从而导致阵列故障。这封信详细研究了电流(电阻)的不稳定性,并提出了一种具有新颖修整方法的参考阵列,该方法可以稳定参考电流水平。所提出的参考阵列具有非常好的直流应力可靠性以及从−40°C至85°C的宽范围温度跟踪性能。

著录项

  • 来源
    《IEEE Electron Device Letters》 |2017年第9期|1224-1227|共4页
  • 作者单位

    Department of Electronics Engineering, Institute of Electronics, National Chiao Tung University, Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

    Department of Electronics Engineering, Institute of Electronics, National Chiao Tung University, Hsinchu, Taiwan;

    Macronix International Co., Ltd., Hsinchu, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Resistance; Fluctuations; Current distribution; Stress; Programming; Temperature distribution; Metals;

    机译:电阻;波动;电流分布;应力;编程;温度分布;金属;

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