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Understanding Temperature Impact on Filament-Related HfO2 Solid-State Incandescent Lighting Emission Devices and Performance Enhancement Using Patterned Wafer Approaches

机译:了解丝网相关HFO 2 固态白炽灯发射装置和使用图案晶片方法的性能增强的温度影响

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摘要

HfO2-based solid-state incandescent light emission devices (SSI-LEDs) with conductive filament-related light emission mechanism are promising candidates for future light emission devices. In this letter, the temperature impact on the electrical and light emission properties of SSI-LEDs has been studied. The increase of the substrate temperature of the device leads to a reduction of the hard breakdown voltage and a decrease of the lighting efficiency. Both behaviorscan be attributed to theSi-diffusion-assisted filament mechanism. By understanding such mechanism, we demonstrate a patterned wafer approach, geometrically confining the electrical field to effectively enhance the lighting performance of HfO2 SSI-LED devices. Our results support the explanation of the underlying light mechanism and open an effective pathway to improve the performance of the SSI-LED devices.
机译:基于HFO2的固态白炽光发射装置(SSI-LED)具有导电丝相关的发光机制是未来发光装置的承诺候选者。在这封信中,研究了对SSI-LED的电气和发光性能的温度影响。装置的基板温度的增加导致硬击穿电压的降低和照明效率的降低。这两种行为都归因于该辅助辅助灯丝机制。通过了解这种机制,我们展示了一种图案化的晶片方法,几何限制电场以有效地提高HFO2 SSI-LED器件的照明性能。我们的结果支持对底层光机制的解释,并打开有效的途径,以提高SSI-LED器件的性能。

著录项

  • 来源
    《IEEE Electron Device Letters》 |2019年第4期|582-585|共4页
  • 作者单位

    Xi An Jiao Tong Univ Sch Elect & Informat Minist Educ Key Lab Phys Elect & Devices Xian 710049 Shaanxi Peoples R China;

    Xi An Jiao Tong Univ Minist Educ Key Lab Elect Mat Res Lab Xian 710049 Shaanxi Peoples R China|Xi An Jiao Tong Univ Sch Elect & Informat Int Ctr Dielect Res Xian 710049 Shaanxi Peoples R China;

    Xi An Jiao Tong Univ Sch Elect & Informat Minist Educ Key Lab Phys Elect & Devices Xian 710049 Shaanxi Peoples R China;

    Xi An Jiao Tong Univ Sch Elect & Informat Minist Educ Key Lab Phys Elect & Devices Xian 710049 Shaanxi Peoples R China;

    Xi An Jiao Tong Univ Minist Educ Key Lab Elect Mat Res Lab Xian 710049 Shaanxi Peoples R China|Xi An Jiao Tong Univ Sch Elect & Informat Int Ctr Dielect Res Xian 710049 Shaanxi Peoples R China;

    IHP Leibniz Inst Innovat Mikroelekt D-15236 Frankfurt Oder Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    HfO2; substrate temperature; patterned wafer;

    机译:HFO2;衬底温度;图案化晶片;

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