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Structural, Electrical, Magnetic and Resistive Switching Properties of the Multiferroic/Ferroelectric Bilayer Thin Films

机译:多体/铁电双层薄膜的结构,电,磁铁和电阻式开关性能

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摘要

Bi 0.8 Pr 0.2 Fe 0.95 Mn 0.05 O 3 /Bi 3.96 Gd 0.04 Ti 2.95 W 0.05 O 12 (BPFMO/BGTWO) bilayer thin films with Multiferroic/Ferroelectric (MF/FE) structures were deposited onto Pt(111)/Ti/SiO 2 /Si(100) substrates by using the sol-gel method with rapid thermal annealing. The BPFMO/BGTWO thin films exhibited well-saturated ferromagnetic and ferroelectric hysteresis loops because of the electro-magnetic coupling induced by the MF/FE structure. The remnant magnetization (2Mr) and remnant polarization (2Pr) were 4.6 emu/cm 3 and 62 ????C/cm 2 , respectively. Moreover, the bipolar I-V switching curves of BPFMO/BGTWO bilayer thin films resistive random access memory (RRAM) devices were discussed, and investigated for LRS/HRS.
机译:BI 0.8 PR 0.2 FE 0.95 MN 0.05 O 3 / BI 3 / BI 3.96 GD 0.04 TI 2.95 W 0.05 O 12(BPFMO / BGTWO)双层薄膜与多体/铁电(MF / FE)结构沉积在PT(111)/ Ti / SiO上沉积在Pt(111)/ Ti / SiO上通过使用快速热退火的溶胶 - 凝胶法使用2 / Si(100)衬底。由于MF / Fe结构诱导的电磁耦合,BPFMO / BGTWO薄膜表现出饱和的铁磁性和铁电滞后环。残余磁化(2MR)和残余偏振(2PR)分别为4.6Mu / cm 3和62 -??? C / cm 2。此外,讨论了BPFMO / BGTWO双层薄膜电阻随机存取存储器(RRAM)器件的双极I-V切换曲线,并针对LRS / HRS进行研究。

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