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机译:通过热和等离子体增强原子层沉积沉积的ZnO薄膜的结构,光学,电和电阻转换特性
Department of Materials Science and Engineering, Zhejiang University, Hangzhou 370027, China;
Department of Materials Science and Engineering, Zhejiang University, Hangzhou 370027, China;
Department of Materials Science and Engineering, Zhejiang University, Hangzhou 370027, China;
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China;
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China,Institute of Renewable Energy & Environment Technology, Bolton University, Deane Road, Bolton BL3 5AB, UK;
ZnO; Thermal; Plasma-enhanced; ALD; Resistive switching;
机译:Zr掺杂对由原子层沉积沉积的薄ZnO膜的光学,电气和微结构性能的影响
机译:不同原子浓度和沉积温度的原子层沉积铝掺杂ZnO薄膜的光学,结构和电学性质研究
机译:等离子体增强原子层沉积法低温生长ZnO薄膜的双极电阻转换特性
机译:通过衬底偏置控制通过等离子体增强原子层沉积法沉积的Al2O3薄膜的机械,结构和光学性质
机译:通过常压金属有机化学气相沉积法沉积的氮化铝薄膜的电,结构和光学性质。
机译:等离子体增强原子层沉积在低温下沉积的HfO2薄膜的结构光学和电学性质
机译:使用等离子体增强的原子层沉积在低温下沉积HFO2薄膜的结构,光学和电性能