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首页> 外文期刊>AIP Advances >Influence of post-deposition selenization and cadmium chloride assisted grain enhancement on electronic properties of cadmium selenide thin films
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Influence of post-deposition selenization and cadmium chloride assisted grain enhancement on electronic properties of cadmium selenide thin films

机译:沉积后硒化和氯化镉辅助晶粒增强对硒磷酸镉电子性质的影响

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We report on the growth, grain enhancement, doping, and electron mobility of cadmium selenide (CdSe) thin films deposited using the thermal evaporation method. The optical measurement shows CdSe is a direct bandgap material with an optical bandgap (Esubgap/sub) of 1.72 eV. CdSe thin films were deposited on fluorine doped tin oxide glass substrates with different thicknesses, and grain size and mobility were measured on the films. CdClsub2/sub was deposited on the films, and the films were subjected to high temperature treatment for several hours. It was found that both grain sizes increased significantly after CdClsub2/sub treatment. The mobility of electrons was measured using the space charge limited current technique, and it was found that the mobility increased significantly after CdClsub2/sub treatment. It was discovered that postdeposition selenization further improved the electrical properties of CdSe thin films by increasing the electron mobility-lifetime product and the photo/dark conductivity ratio. CdSe films after postselenization also showed significantly lower values for midgap states and Urbach energies for valence band tail states.
机译:我们报告使用热蒸发方法沉积的硒化镉(CDSE)薄膜的生长,谷物增强,掺杂和电子迁移率。光学测量显示CDSE是一种直接带隙材料,具有1.72eV的光学带隙(E 间隙)。 Cdse薄膜沉积在具有不同厚度的氟掺杂氧化锡玻璃基板上,并在薄膜上测量晶粒尺寸和迁移率。将CdCl 2 沉积在薄膜上,并将薄膜进行高温处理几个小时。发现,在CDCL 2 处理后,粒度均显着增加。使用空间电荷有限电流技术测量电子的迁移率,发现在CDCl <亚> 2 处理后,迁移率显着增加。发现通过增加电子迁移率 - 寿命产品和光/暗电导率,再沉积硒化进一步改善了CDSE薄膜的电性能。后期化后的CDSE薄膜还显示了中光态的值和价值频段尾态的URBACH能量。

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