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Structural determination of bilayer graphene on SiC(0001) using synchrotron radiation photoelectron diffraction

机译:使用同步辐射光电子衍射结构测定SiC(0001)上的双层石墨烯

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In recent years there has been growing interest in the electronic properties of ‘few layer’ graphene films. Twisted layers, different stacking and register with the substrate result in remarkable unconventional couplings. These distinctive electronic behaviours have been attributed to structural differences, even if only a few structural determinations are available. Here we report the results of a structural study of bilayer graphene on the Si-terminated SiC(0001) surface, investigated using synchrotron radiation-based photoelectron diffraction and complemented by angle-resolved photoemission mapping of the electronic valence bands. Photoelectron diffraction angular distributions of the graphene C 1s component have been measured at different kinetic energies and compared with the results of multiple scattering simulations for model structures. The results confirm that bilayer graphene on SiC(0001) has a layer spacing of 3.48?? and an AB (Bernal) stacking, with a distance between the C buffer layer and the first graphene layer of 3.24??. Our work generalises the use of a versatile and precise diffraction method capable to shed light on the structure of low-dimensional materials.
机译:近年来,对“少数层”石墨烯薄膜的电子性质越来越感兴趣。扭曲的层,不同的堆叠和与基板的寄存器导致非传统联轴器显着。这些独特的电子行为已经归因于结构差异,即使只有少数结构测定。在这里,我们在Si封端的SiC(0001)表面上报道了双层石墨烯的结构研究的结果,研究了使用基于同步辐射的光电子衍射来研究并由电子价频带的角度分辨的光电映射互补。图石墨烯C 1S组分的光电子衍射角分布已经在不同的动力学下测量,并与模型结构的多个散射模拟的结果进行比较。结果证实,SiC(0001)上的双层石墨烯具有3.48的层间距。和AB(Bernal)堆叠,C缓冲层与3.24的第一石墨烯层之间的距离。我们的工作推出了使用一种能够在低维材料结构上脱落光的多功能和精确的衍射方法。

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