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Surface Characteristics of Silicon Nanowires/Nanowalls Subjected to Octadecyltrichlorosilane Deposition and n-octadecane Coating

机译:硅氧烷纳米线/纳米金属的表面特性对十八烷基三氯硅烷沉积和正碳烷涂层

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In this study, nanowiresanowalls were generated on a silicon wafer through a chemical etching method. Octadecyltrichlorosilane (OTS) was deposited onto the nanowireanowall surfaces to alter their hydrophobicity. The hydrophobic characteristics of the surfaces were further modified via a 1.5-μm-thick layer of n-octadecane coating on the OTS-deposited surface. The hydrophobic characteristics of the resulting surfaces were assessed using the sessile water droplet method. Scratch and ultraviolet (UV)-visible reflectivity tests were conducted to measure the friction coefficient and reflectivity of the surfaces. The nanowires formed were normal to the surface and uniformly extended 10.5?μm to the wafer surface. The OTS coating enhanced the hydrophobic state of the surface, and the water contact angle increased from 27° to 165°. The n-octadecane coating formed on the OTS-deposited nanowiresanowalls altered the hydrophobic state of the surface. This study provides the first demonstration that the surface wetting characteristics change from hydrophobic to hydrophilic after melting of the n-octadecane coating. In addition, this change is reversible; i.e., the hydrophilic surface becomes hydrophobic after the n-octadecane coating solidifies at the surface, and the process again occurs in the opposite direction after the n-octadecane coating melts.
机译:在该研究中,通过化学蚀刻方法在硅晶片上产生纳米线/纳米座。八氯丙基三氯硅烷(OTS)沉积在纳米线/纳米罩表面上以改变它们的疏水性。通过在OTS沉积的表面上通过1.5μm稠癸烷涂层进一步改性表面的疏水特性。使用无柄水滴法评估所得表面的疏水特性。进行刮擦和紫外线(UV)可行的反射率试验以测量表面的摩擦系数和反射率。形成的纳米线垂直于表面并均匀地延伸10.5Ωμm至晶片表面。 OTS涂层增强了表面的疏水状态,水接触角从27°增加到165°。在OTS沉积的纳米线/纳米座上形成的正碳烷涂层改变了表面的疏水状态。本研究提供了第一次证明,即在熔化正交酸涂层后,表面润湿特性从疏水到亲水性的变化。此外,这种变化是可逆的;即,亲水表面在表面固化后凝固后变得疏水,并且在正八碳烷涂层熔体之后再次在相反的方向上发生。

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