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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Deposition of nanostructured metal coatings on the modified silicon surfaces in the magnetoplasma compressor
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Deposition of nanostructured metal coatings on the modified silicon surfaces in the magnetoplasma compressor

机译:在磁浆压缩机中在改性硅表面上沉积纳米结构金属涂层

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摘要

The process of formation of nanostructured metal coatings on silicon and sodium chloride surfaces exposed to compression plasma flow has been studied. To analyze microstructure, morphology, elemental and phase composition of near-surface layer, methods of scanning electron microscopy (SEM), energy dispersive X-ray (EDX) microanalysis, and transmission electron microscopy (TEM) were used. The coating obtained looks like a monolayer consisting of spherical particles, a few to 200 nm in size, bonded to each other. These particles cover both plane surface areas and cylindrical structures formed in the course of plasma treatment. The coating thickness correlates with sizes of particles. (c) 2005 Elsevier Ltd. All rights reserved.
机译:研究了暴露于压缩等离子体流的硅和氯化钠表面上纳米结构金属涂层的形成过程。为了分析近表面层的微观结构,形态,元素和相组成,使用了扫描电子显微镜(SEM),能量色散X射线(EDX)显微分析和透射电子显微镜(TEM)的方法。所获得的涂层看起来像一个单层,由相互粘合的几到200 nm大小的球形颗粒组成。这些颗粒覆盖在等离子体处理过程中形成的平面表面积和圆柱结构。涂层厚度与颗粒尺寸相关。 (c)2005 Elsevier Ltd.保留所有权利。

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