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首页> 外文期刊>Bulletin of the American Physical Society >APS -APS March Meeting 2017 - Event - In-situ Epitaxial Growth of Lateral WS2/WS2xSe2(1-x)/WS2 Multijunctions with 100-fold Photoconductivity
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APS -APS March Meeting 2017 - Event - In-situ Epitaxial Growth of Lateral WS2/WS2xSe2(1-x)/WS2 Multijunctions with 100-fold Photoconductivity

机译:APS -APS 3月会议2017 - 事件 - 原位外延生长横向WS2 / WS2XSE2(1-X)/ WS2具有100倍光电导性的多功能

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Conventional semiconductor Heterojunctions (HJ) have played a critical role in advanced electronic and photonic devices. Consequently, after the discovery of atomically thin transition metal dichalcogenides (TMDs), as 2D semiconductors, TMD-based HJs have quickly attracted a lot of attentions. TMD HJ can be formed either vertically (in this sense, similar to conventional HJ but with atomically thin individual layers) or laterally (in this case, to a lower dimension). CVD growth has been shown to be a powerful technique to create lateral HJ. However, to bring the technological potential to another level, multiple heterojunctions (MJ) such as quantum wells will need to be developed. Here, we report a successful in-situ 3-step epitaxial growth of lateral WS2/WS2xSe2(1-x)/WS2 MJ by following suitable growth conditions. Photoluminescence (PL) and Raman characterizations have verified our lateral MJ of the triangular core-ring-ring configuration and indicated the composition x to be 0.85. Unexpectedly, Microwave-impedance-microscopy measurements have extracted the photoconductivity in WS2xSe2(1-x) alloy domain to be 100-fold comparing to the photoconductivity in WS2 domain.
机译:常规半导体异质谐波(HJ)在先进的电子和光子器件中发挥着关键作用。因此,在发现原子薄过渡金属二甲基甲基(TMDS)之后,作为2D半导体,TMD基HJ迅速吸引了大量的关注。 TMD HJ可以垂直地(从这个意义上类似于传统的HJ而是用原子薄的单层)或横向(在这种情况下,较低尺寸)。 CVD增长已被证明是创建横向HJ的强大技术。然而,为了使技术潜力达到另一个水平,需要开发多种杂交(MJ),例如量子孔。在这里,我们通过以下合适的生长条件报告横向WS2 / WS2XSE2(1-X)/ WS2MJ的成功原位3步外延生长。光致发光(PL)和拉曼特征已经验证了三角形芯环环构造的横向MJ,并将组合物X表示为0.85。出乎意料地,微波阻抗显微镜测量在WS2xSe2(1-x)合金结构域中的光电导性提取到100倍,与WS2结构域中的光电导率相比。

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