Boron carbide coating deposition on tungsten substrates from atomic fluxes of boron and carbon

Y Sadovskiy; L Begrambekov; A Ayrapetov; I Gretskaya; A Grunin; M Dyachenko; N Puntakov

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Boron carbide coating deposition on tungsten substrates from atomic fluxes of boron and carbon

机译：硼和碳的原子通量在钨基体上沉积碳化硼涂层

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Adeviceusedforbothcoatingdepositionandmaterialtestingispresentedinthepaper.Byusinglockchambers,sputteringtargetsareeasilyexchangedwithsampleholderthusallowingtestingofdepositedsampleswithhighpowerdensityelectronorionbeams.Boroncarbidecoatingsweredepositedontungstensamples.Methodsofincreasingcoatingadhesionaredescribedinthepaper.2μmboroncarbidecoatingssustained450heatingcyclesfrom100to900C.Ionbeamtestshaveshownsatisfactoryresults...

机译：通过锁定腔室，可以轻松地与样品架交换溅射靶，从而可以用高功率密度的电子负离子束对沉积的样品进行测试。在整个钨丝上将碳酸盐涂层沉积在整个样品上，将其保持在900上，以便在整个样品上沉积2个碳酸盐，然后将其上的2个表面上的碳沉积下来。

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《Journal of Physics: Conference Series》 |2016年第1期|共页
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Y Sadovskiy; L Begrambekov; A Ayrapetov; I Gretskaya; A Grunin; M Dyachenko; N Puntakov;
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中图分类物理学;
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1. Boron carbide coating deposition on tungsten and testing of tungsten layers and coating under intense plasma load [J] . Airapetov A. A., Begrambekov L. B., Buzhinskiy O. I., Physics of atomic nuclei . 2015,第14期

机译：碳化硼涂层在钨上的沉积以及在强等离子体负载下测试钨层和涂层
2. Microstracture and deposition mechanism of CVD amorphous boron carbide coatings deposited on SiC substrates at low temperature [J] . Bin Zeng, Zude Feng, Siwei Li CERAMICS INTERNATIONAL . 2009,第5期

机译：低温沉积在SiC衬底上的CVD非晶碳化硼涂层的显微组织和沉积机理
3. Growth of cubic boron nitride films on tungsten carbide substrates by direct current jet plasma chemical vapor deposition [J] . J. Yu, S. Matsumoto Journal of Materials Research . 2004,第5期

机译：直流射流等离子体化学气相沉积法在碳化钨衬底上生长立方氮化硼膜
4. Boron Doping Effects on Mechanical Properties of Ultrananocrystalline Diamond/Amorphous Carbon Composite Films Deposited on Cemented Carbide Substrates by Coaxial Arc Plasma Deposition [C] . Tsuyoshi Yoshitake, Mohamed Egiza, Kouki Murasawa, 応用物理学会秋季学術講演会;応用物理学会 . 2019

机译：硼掺杂对同轴电弧等离子体沉积沉积在硬质合金衬底上的超纳米晶金刚石/非晶碳复合膜力学性能的影响
5. Synthesis and characterization of titanium carbide, titanium boron carbonitride, titanium boride/titanium carbide and titanium carbide/chromium carbide multilayer coatings by reactive and ion beam assisted, electron beam-physical vapor deposition (EB-PVD). [D] . Wolfe, Douglas Edward. 2001

机译：通过反应和离子束辅助，电子束物理气相沉积（EB-PVD）合成和表征碳化钛，碳氮化钛硼，硼化钛/碳化钛和碳化钛/碳化铬多层涂层。
6. Structure Investigations of Islands with Atomic-Scale Boron–Carbon Bilayers in Heavily Boron-Doped Diamond Single Crystal: Origin of Stepwise Tensile Stress [O] . S. N. Polyakov, V. N. Denisov, V. V. Denisov, 2021

机译：大型硼掺杂金刚石单晶中原子硼 - 碳双层的岛屿的结构研究：逐步拉伸应力的来源
7. Effects of heat treatment on the microstructure of amorphous boron carbide coating deposited on graphite substrates by chemical vapor deposition [O] . Li Siwei, Zeng Bin, Feng Zude, 2010

机译：热处理对化学气相沉积沉积在石墨基底上的非晶碳化硼涂层微观结构的影响
8. Theoretical Influence of the Deposition Conditions on the Uniformity of Boron Carbide Coatings [R] . Vandenbulcke, L. 1983

机译：沉积条件对碳化硼涂层均匀性的理论影响

Boron carbide coating deposition on tungsten substrates from atomic fluxes of boron and carbon

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