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Boron Doping Effects on Mechanical Properties of Ultrananocrystalline Diamond/Amorphous Carbon Composite Films Deposited on Cemented Carbide Substrates by Coaxial Arc Plasma Deposition

机译:硼掺杂对同轴电弧等离子体沉积沉积在硬质合金衬底上的超纳米晶金刚石/非晶碳复合膜力学性能的影响

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Ultrananocrystalline diamond/amorphous carbon composite (UNCD/a-C) film, wherein a significant number of diamond grains (diameters<10 nm) are embedded in an amorphous carbon matrix, is a new hard coating material for cemented carbide (WC-Co) cutting tools. In our previous study, we have realized the formation of UNCD/a-C films having the hardness of 50 GPa. It has been reported that boron doping facilitates the growth of diamond grains. In this study, to enhance the hardness further, boron doping effects on the structural and mechanical properties of UNCD/a-C films were investigated.
机译:超纳米晶金刚石/非晶碳复合材料(UNCD / aC)膜,其中大量金刚石晶粒(直径<10 nm)嵌入非晶碳基体中,是用于硬质合金(WC-Co)切削工具的新型硬质涂层材料。在我们先前的研究中,我们已经实现了硬度为50 GPa的UNCD / a-C膜的形成。据报道,硼掺杂促进了金刚石晶粒的生长。在这项研究中,为进一步提高硬度,研究了硼掺杂对UNCD / a-C膜的结构和机械性能的影响。

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