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Crystal Growth Control of Functional Oxide Thin Films on Nanopatterned Substrate Surfaces

机译:纳米图案化基底表面上功能性氧化物薄膜的晶体生长控制

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A straight nanogroove striped pattern can be formed on the surface of NiO thin film by room temperature epitaxial growth in pulsed laser deposition (PLD) on a 0.2 nm-high regularly stepped sapphire (α-Al2O3 single crystal) (0001) substrate and post annealing of the film. The interval and depth of each nanogroove were about 80 and 20nm, respectively. Wedge shaped nanogrooves were observed on the entire film (~ 10 × 10 mm2) and characterized on an atomic scale by high resolu-tion transmission electron microscope (TEM). Using the nanogrooved NiO thin film or atomically stepped sapphire substrate as thermal nanoimprint mold for glass, surface nanopatterning of the silicate glass plate was successfully carried out. The straight nanogroove pattern or sub-nanometer stepped pattern were inversely transferred onto the glass surface. Growth control of transparent conducting indium tin oxide (ITO) thin films was then examined on the nanoscale step-patterned glass plates by PLD. The surface morphology of the obtained ITO thin films reflected the stepped pattern of the glass plate well. Strongly oriented film growth was achieved on the nanopatterned glass. The resistivity of ITO thin film deposited on the nanoimprinted glass was lower than that of the film on the commercial glass.
机译:通过在0.2 nm高规则阶梯状蓝宝石(α-Al2O3单晶)(0001)衬底上进行脉冲激光沉积(PLD)中的室温外延生长,可以在NiO薄膜的表面上形成直的纳米沟槽条纹图案,并进行后退火电影的每个纳米沟槽的间隔和深度分别约为80nm和20nm。在整个薄膜(〜10×10 mm2)上观察到楔形纳米沟槽,并通过高分辨率透射电子显微镜(TEM)在原子尺度上进行表征。使用纳米沟槽的NiO薄膜或原子阶梯状的蓝宝石衬底作为玻璃的热纳米压印模具,成功地进行了硅酸盐玻璃板的表面纳米图案化。将直的纳米凹槽图案或亚纳米阶梯图案反向转移到玻璃表面上。然后通过PLD在纳米级阶梯式图案玻璃板上检查透明导电铟锡氧化物(ITO)薄膜的生长控制。所获得的ITO薄膜的表面形态很好地反映了玻璃板的阶梯状图案。在纳米图案玻璃上实现了强取向的薄膜生长。沉积在纳米压印玻璃上的ITO薄膜的电阻率低于商用玻璃上的ITO。

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