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Adsorption of NO Gas Molecules on Monolayer Arsenene Doped with Al, B, S and Si: A First-Principles Study

机译:NO气体分子在Al,B,S和Si掺杂的单层砷上的吸附:第一性原理研究

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The structures and electronic properties of monolayer arsenene doped with Al, B, S and Si have been investigated based on first-principles calculation. The dopants have great influences on the properties of the monolayer arsenene. The electronic properties of the substrate are effectively tuned by substitutional doping. After doping, NO adsorbed on four kinds of substrates were investigated. The results demonstrate that NO exhibits a chemisorption character on Al-, B- and Si-doped arsenene while a physisorption character on S-doped arsenene with moderate adsorption energy. Due to the adsorption of NO, the band structures of the four systems have great changes. It reduces the energy gap of Al- and B-doped arsenene and opens the energy gap of S- and Si-doped arsenene. The large charge depletion between the NO molecule and the dopant demonstrates that there is a strong hybridization of orbitals at the surface of the doped substrate because of the formation of a covalent bond, except for S-doped arsenene. It indicates that Al-, B- and Si-doped arsenene might be good candidates as gas sensors to detect NO gas molecules owning to their high sensitivity.
机译:基于第一性原理研究了掺Al,B,S和Si的单层砷的结构和电子性能。掺杂剂对单层砷的性能有很大的影响。基板的电子特性可通过替代掺杂有效地调整。掺杂后,研究了吸附在四种基材上的NO。结果表明,NO在具有中等吸附能的Al,B和Si掺杂的砷上表现出化学吸附特性,而在S掺杂的砷上表现出化学吸附特性。由于NO的吸附,四个系统的能带结构发生了很大变化。它减小了Al和B掺杂的砷的能隙,并打开了S和Si掺杂的砷的能隙。 NO分子和掺杂剂之间的大量电荷耗尽表明,由于共价键的形成,除了S掺杂的砷外,在掺杂衬底的表面上存在强烈的轨道杂化。这表明,Al,B和Si掺杂的砷可能是检测高NO气体分子的气体传感器的良好候选者。

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