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A study on electrodeposited Nie?‘¥Fe1a?’e?‘¥ alloy films

机译:电沉积Nie?¥ Fe1a?e?¥合金膜的研究

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Nie?‘¥Fe1a?’e?‘¥ (0.22 a‰¤ e?‘¥ a‰¤ 0.62) alloy films were grown by electrodeposition technique. A shift in diffraction peaks of NiFe and Ni3Fe was detected with increasing Ni content. The highest positive magnetoresistance ratio was detected as 5% in Ni0.51Fe0.49. Positive and negative anisotropic magnetoresistance were observed in longitudinal and transverse geometries respectively. The highest anisotropic magnetoresistance ratio of 9.8% was also detected in Ni0.51Fe0.49. The angular variation of magnetoresistance was studied. Magnetisation loop curves show that NiFe alloy films have a linear decreasing anisotropy constant with increasing Ni deposit content and show a decreasing behavior of coercivity which indicates soft magnetic property with increasing Ni deposit content.
机译:通过电沉积技术生长了Nie?'¥ Fe1a?'e?'¥(0.22 a‰¤e?¥¥ 0.62)合金膜。随着Ni含量的增加,检测到NiFe和Ni3Fe的衍射峰移动。在Ni0.51Fe0.49中检测到最高的正磁阻比为5%。在纵向和横向几何形状中分别观察到正负各向异性磁阻。在Ni0.51Fe0.49中也检测到了最高的9.8%各向异性磁阻比。研究了磁阻的角度变化。磁化回路曲线表明,NiFe合金膜的各向异性常数随Ni沉积物含量的增加而线性减小,并且矫顽力下降,这表明随着Ni沉积物含量的增加,软磁性能。

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