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Magnetic and Mossbauer spectroscopy study of Fe-Cr-Al thin films sputtered on Si substrates

机译:硅衬底上溅射的Fe-Cr-Al薄膜的磁和Mossbauer光谱研究

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Fe and Fe-Cr-Al thin films, both as sputtered on Si substrates as well as aftersubsequent annealing treatments in hydrogen atmosphere, have been investigated bymeans of X-ray reflectometry, magneto-optic Kerr effect and Mssbauer spectroscopywith respect to structural and related magnetic characteristics. The as deposited filmsare showing chemically disordered bcc structures, assigned to Fe-Si and Fe-Cr-Al-Siphases, respectively, with soft magnetism and magnetic texture, both influenced bythe presence of Si, Cr and Al atoms. The softness of the films as well as the magnetictexture are strongly modified via hydrogenation treatments. In addition, suchtreatments induce the expulsion of Si, Cr and Al atoms from the as deposited phases,providing almost pure Fe films of much well crystallized bcc structure.
机译:通过X射线反射法,磁光Kerr效应和Mssbauer光谱学的方法研究了溅射在Si衬底上以及随后在氢气氛中进行退火处理后的Fe和Fe-Cr-Al薄膜特征。所沉积的膜显示出化学无序的bcc结构,分别分配给Fe-Si和Fe-Cr-Al-Si相,具有软磁性和磁织构,两者均受Si,Cr和Al原子的存在的影响。薄膜的柔软度以及磁性纹理通过氢化处理得到了强烈的改善。此外,这种处理可从沉积相中驱逐Si,Cr和Al原子,从而提供几乎完全纯净的bcc结构的Fe膜。

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