2 or less. The sputtering target comprising an oxide phase dispersed in a Co or Co alloy phase enables the reduction in arcing, can achieve steady electrical discharge in a magnetron sputtering device, and produces a reduced amount of particles upon sputtering at a high density."/>
公开/公告号WO2011070850A1
专利类型
公开/公告日2011-06-16
原文格式PDF
申请/专利号WO2010JP67947
申请日2010-10-13
分类号C23C14/34;C23C14/06;C23C14/14;G11B5/64;G11B5/851;H01F10/16;H01F10/18;H01F41/18;
国家 WO
入库时间 2022-08-21 17:57:13