Cr-Mn-B-BASED SPUTTERING TARGET MATERIAL FOR PRODUCING SUBSTRATE FILM IN MAGNETIC RECORDING MEDIUM, AND THIN FILM PRODUCED USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a Cr-Mn-Ba-based sputtering target material used as a substrate film in a magnetic recording medium, and to provide a thin film produced by using the same.;SOLUTION: Disclosed are a Cr-Mn-B-based sputtering target material for producing a substrate film in a magnetic recording medium comprising, by at%, 5 to 35% Mn and 0.1 to 10% B, and the balance Cr with inevitable impurities, and a method for producing the same. Also disclosed is a Cr-Mn-B-based thin film produced using the above sputtering target material.;COPYRIGHT: (C)2009,JPO&INPIT