首页> 外国专利> SOFT MAGNETIC BACKING LAYER FILM FOR MAGNETIC RECORDING MEDIUM, SPUTTERING TARGET MATERIAL FOR FORMING SOFT MAGNETIC BACKING LAYER FILM FOR MAGNETIC RECORDING MEDIUM, AND METHOD FOR PRODUCING SOFT MAGNETIC BACKING LAYER FILM FOR MAGNETIC RECORDING MEDIUM

SOFT MAGNETIC BACKING LAYER FILM FOR MAGNETIC RECORDING MEDIUM, SPUTTERING TARGET MATERIAL FOR FORMING SOFT MAGNETIC BACKING LAYER FILM FOR MAGNETIC RECORDING MEDIUM, AND METHOD FOR PRODUCING SOFT MAGNETIC BACKING LAYER FILM FOR MAGNETIC RECORDING MEDIUM

机译:用于磁记录介质的软磁衬层膜,用于形成用于磁记录介质的软磁衬层膜的溅射靶材料以及用于生产用于磁记录介质的软磁衬层膜的方法

摘要

PROBLEM TO BE SOLVED: To provide a soft magnetic backing layer film for a magnetic recording medium, the film having an amorphous structure that can achieve saturation magnetic flux density and magnetic permeability both in high levels.;SOLUTION: The soft magnetic backing layer film for a magnetic recording medium comprises a Co-Fe alloy, wherein the composition ratio of Co and Fe represented by atomic% in the soft magnetic backing layer film is in the range from 88:12 to 92:8, and the film contains as additive elements, both of 3.0 atomic% or more of Zr and 2.0 atomic% or more of at least one kind, two kinds or more selected from a group consisting of B, Y, Nb Hf and Ta, with the total content of the additive elements ranging from 5.0 to 9.0 atomic%. A sputtering target material for forming the soft magnetic backing layer film for a magnetic recording medium is provided, having the same composition as above described. A method for manufacturing the soft magnetic backing layer film for a magnetic recording medium is also provided, in which the film is formed by a sputtering method using the above sputtering target.;COPYRIGHT: (C)2012,JPO&INPIT
机译:要解决的问题:为了提供用于磁记录介质的软磁衬层膜,该膜具有无定形结构,该结构可以同时实现高水平的饱和磁通密度和磁导率。磁记录介质包括Co-Fe合金,其中在软磁衬里膜中以原子%表示的Co和Fe的组成比在88:12至92:8的范围内,并且该膜包含作为添加元素选自B,Y,Nb Hf和Ta中的至少一种,选自B,Y,Nb Hf和Ta的两种或两种以上,Zr的3.0原子%以上和2.0原子%以上,添加元素的总含量为从5.0到9.0原子%。提供用于形成用于磁记录介质的软磁衬里层膜的溅射靶材料,其具有与上述相同的组成。还提供一种制造用于磁记录介质的软磁衬里膜的方法,其中该膜通过使用上述溅射靶的溅射方法形成。;版权所有:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2012022765A

    专利类型

  • 公开/公告日2012-02-02

    原文格式PDF

  • 申请/专利权人 HITACHI METALS LTD;

    申请/专利号JP20110134831

  • 申请日2011-06-17

  • 分类号G11B5/738;G11B5/851;C23C14/34;

  • 国家 JP

  • 入库时间 2022-08-21 17:41:20

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