Tailoring sp2/sp3 ratio in diamond-like carbon films via deposition parameters in a high voltage anodic vacuum plasma

摘要

Tailoring sp~(2)/sp~(3) ratio in diamond-like carbon thin films offers new surface engineering solutions for the continuously increasing devices requirements in various fields. We report here the control of sp~(2)/sp~(3) carbon content using the high voltage anodic plasma in vacuum. Correlation of data obtained by visible Raman Spectroscopy and XPS spectra of our DLC films with deposition parameters showed an increase in sp~(3) bonding of about 10% when decreasing the discharge voltage from 600 V to 200 V or increasing the anode-substrate distance from 15 cm to 36 cm.