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Structure and properties of fluorine doped diamond-like carbon films synthesized by pulsed vacuum arc plasma deposition

机译:脉冲真空电弧等离子体沉积合成氟掺杂类金刚石碳膜的结构与性能

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Summary form only given. Fluorine addition to a-C (amorphous carbon) thin films offers many advantages and a deeply understanding of the properties of a-C: F thin films is necessary for applications like biomedical implants and biosensor devices. Fluorine doped diamond-like carbon (a-C:F) films with different fluorine content were fabricated on Si wafer by pulsed vacuum arc plasma deposition. Film composition and structure were characterized by X-ray photoelectron spectroscopy (XPS) and Raman scattering spectroscopy. Surface morphology and roughness were analyzed by atomic force microscopy (AFM). Hardness and scratch resistance were measured by nano-indentation and nano-scratch, respectively. Water contact angles were measured by sessile drop method.
机译:仅提供摘要表格。在a-C(无定形碳)薄膜中添加氟有许多优点,并且对a-C的特性有深刻的了解:F薄膜对于诸如生物医学植入物和生物传感器设备之类的应用是必不可少的。通过脉冲真空电弧等离子体沉积在硅片上制备了氟含量不同的掺氟类金刚石碳(a-C:F)薄膜。通过X射线光电子能谱(XPS)和拉曼散射光谱来表征膜的组成和结构。通过原子力显微镜(AFM)分析表面形态和粗糙度。硬度和耐刮擦性分别通过纳米压痕和纳米刮擦来测量。通过无滴法测量水接触角。

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