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首页> 外文期刊>Serbian Journal of Electrical Engineering >Synergetic effect of additives on the hardness and adhesion of thin electrodeposited copper films
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Synergetic effect of additives on the hardness and adhesion of thin electrodeposited copper films

机译:添加剂对薄电沉积铜膜硬度和附着力的协同作用

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摘要

Thin copper films were electrodeposited on a polycrystalline coldrolled copper substrate. The composition of the laboratory-made copper sulphate electrolyte was changed by the addition of various additives. The influence of chloride ion (Cl-), polyethylene glycol (PEG) and 3-mercapto-1-propane sulfonic acid (MPSA) on mechanical and adhesion properties of the electrodeposited copper films was investigated using Vickers microindentation technique. Calculations of the film hardness and adhesion were carried out using composite hardness models of Korsunsky and Chen-Gao. The hardness of the composite system is influenced by the adhesion of the copper film to the substrate. Increasing adhesion corresponds to increasing values of the calculated adhesion parameter b, named the critical reduced depth. When additives are added to a plating solution, the copper deposition mechanism is changed and fine-grained microstructure without the formation of microscopic nodules is obtained. [Project of the Serbian Ministry of Education, Science and Technological Development, Grant no. TR 32008, Grant no. TR 34011 and Grant no. III 45019]
机译:铜薄膜被电沉积在多晶冷轧铜基板上。通过添加各种添加剂来改变实验室制硫酸铜电解质的组成。采用维氏显微压痕技术研究了氯离子(Cl-),聚乙二醇(PEG)和3-巯基-1-丙烷磺酸(MPSA)对电沉积铜膜力学性能和附着性能的影响。使用Korsunsky和Chen-Gao的复合硬度模型进行膜硬度和附着力的计算。复合系统的硬度受铜膜与基材粘附的影响。附着力的增加对应于计算出的附着力参数b的值的增加,称为临界减小深度。当将添加剂添加到电镀液中时,铜的沉积机理发生了变化,并且获得了细微的微观结构,而没有形成微小的结核。 [塞尔维亚教育,科学和技术发展部的项目,赠款TR 32008,授权号TR 34011和授权号III 45019]

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