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首页> 外文期刊>SEI Technical Review >Low Dark Current SWIR Photodiode with InGaAs/GaAsSb Type II Quantum Wells Grown on InP Substrate
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Low Dark Current SWIR Photodiode with InGaAs/GaAsSb Type II Quantum Wells Grown on InP Substrate

机译:InP衬底上生长的具有InGaAs / GaAsSb II型量子阱的低暗电流SWIR光电二极管

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We have developed a PIN photodiode with a type II quantum well structure, which can operate in the short wavelength region up to 2.5 μm. This photodiode will make uncooled operation possible. The absorption layer consisting of 250 pair-InGaAs(5nm)/ GaAsSb(5nm) quantum well structures was grown on InP substrates by solid source MBE method. The p-n junctions were formed in the absorption layer by the selective diffusion of zinc. Dark current density was 0.92 mA/cm2 , which was smaller than that of a conventional HgCdTe detector. The responsivity at 2.2 μm was 0.6A/W.
机译:我们开发了一种具有II型量子阱结构的PIN光电二极管,该光电二极管可以在高达2.5μm的短波长范围内工作。该光电二极管将使非制冷操作成为可能。通过固源MBE法在InP衬底上生长由250对InGaAs(5nm)/ GaAsSb(5nm)量子阱结构组成的吸收层。通过锌的选择性扩散在吸收层中形成p-n结。暗电流密度为0.92 mA / cm2,比常规HgCdTe检测器的暗电流密度小。 2.2μm时的响应度为0.6A / W。

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