首页> 外文会议>Indium Phosphide amp; Related Materials, 2009. IPRM '09 >Low dark current SWIR photodiode with InGaAs/GaAsSb Type II quantum wells grown on InP substrate
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Low dark current SWIR photodiode with InGaAs/GaAsSb Type II quantum wells grown on InP substrate

机译:具有在InP衬底上生长的InGaAs / GaAsSb II型量子阱的低暗电流SWIR光电二极管

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摘要

For sensing short wavelength infrared (SWIR) region (1.0-2.5 mum), photodiodes with In0.53Ga0.47As/GaAs0.5Sb0.5 type II quantum well structure grown on InP substrate by solid source molecular beam epitaxy (MBE), were successfully fabricated. Low dark current was obtained by improving GaAsSb crystalline quality.
机译:为了感测短波红外(SWIR)区域(1.0-2.5 mum),使用In 0.53 Ga 0.47 As / GaAs 0.5 Sb 0.5 Ⅱ型量子阱结构。通过改善GaAsSb的晶体质量,获得了低暗电流。

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