Effect of gamma irradiation dose on the structure and pH sensitivity of ITO thin films in extended gate field effect transistor

摘要

Even though several studies have demonstrated the use of Indium Tin Oxides (ITO) as an extended gate field effect transistor (EGFET), the effect of different doses of gamma radiation on the intrinsic properties of the ITO films has not been considered. This study investigates the effect of gamma irradiation on the structural, optical, morphological and electrical properties as well as pH sensitivity (as an extended gate field effect transistor) of ITO thin films. ITO thin films with thickness of 400?nm were prepared using a radio frequency sputtering technique. The samples were then subjected to various doses of gamma radiation from a Co-60 radio-isotope (0.5?kGy, 1?kGy, 1.5?kGy, and 2?kGy). The structural and morphological changes as well as transmission and absorption of the thin films were analyzed using X-ray diffraction (XRD), Atomic Force Microscopy (AFM), Field-Emission Scanning Electron Microscope (FESEM) and UV–Vis spectrophotometry, before and after irradiation. The irradiated ITO thin films were then used as an extended gate field effect transistor to determine its ability to improve sensitivity as pH sensors. The grain size and transmittance in the range 300–900?nm of the ITO films were found to decrease with increasing gamma irradiation dose. In contrast, the uniformity and surface roughness of ITO thin films increased with increasing gamma radiation dose due to the formation of lattice defects. Moreover, the electrical resistance of the thin films increased with increasing dose because of the low current density and high number of surface defects associated with irradiation. The pH sensitivity of the ITO thin films improved after irradiation, possibly due to the concomitant increase in surface roughness with increasing radiation dose. The improvements in the pH sensitivity of ITO thin films after irradiation justify their potential use as pH sensors.