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High-sensitivity extended-gate field-effect transistors as pH sensors with oxygen-modified reduced graphene oxide films coated on different reverse-pyramid silicon structures as sensing heads

机译:作为pH传感器的高灵敏度扩展栅场效应晶体管,其中在不同的反金字塔硅结构上涂覆了氧改性的氧化石墨烯薄膜作为传感头

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A high-performance extended-gate field-effect transistor (EGFET) as pH sensor with its microstructured sensing head composed of an oxygen-modified reduced graphene oxide film (RGOF) on a reverse-pyramid (RP) Si structure was developed to achieve a high sensitivity of 57.5mV/pH with an excellent linearity of 0.9929 in a wide pH sensing range of 1-13. These features were ascribed to the large amount of sensing sites and large sensing area. In contrast, the planar Si substrate with the oxygen-plasma-treated RGOF (OPT-RGOF) at the optimal bias power showed a sensitivity of 52.9mV/pH compared with 45.0mV/pH for that without plasma treatment. It reveals that oxygen plasma can produce oxygen-containing groups as sensing sites, enhancing proton sensing characteristics. However, oxygen plasma treatment at high bias powers would cause damage to the RGOFs, resulting in poor conducting and sensing properties. On the other hand, the use of the RP structures could increase the effective sensing area and further promote the sensing performance. (C) 2016 The Japan Society of Applied Physics
机译:开发了一种高性能的扩展栅场效应晶体管(EGFET)作为pH传感器,其微结构感测头由反金字塔(RP)Si结构上的氧改性还原氧化石墨烯膜(RGOF)组成,从而实现了在1-13的宽pH感应范围内,具有57.5mV / pH的高灵敏度和0.9929的出色线性。这些特征归因于大量的感测部位和较大的感测面积。相反,在最佳偏置功率下具有氧等离子体处理的RGOF(OPT-RGOF)的平面Si基板的灵敏度为52.9mV / pH,而未进行等离子体处理的灵敏度为45.0mV / pH。它揭示了氧等离子体可以产生含氧基团作为感测位点,从而增强质子感测特性。但是,在高偏置功率下进行氧等离子体处理会损坏RGOF,从而导致较差的导电和感测性能。另一方面,RP结构的使用可以增加有效的感测面积并进一步提高感测性能。 (C)2016年日本应用物理学会

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