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首页> 外文期刊>Research Journal of Applied Sciences: RJAS >Monte Carlo Simulation of GaN Submicron n+-n-n+ Diode with AlGaN Heterojunction Cathode
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Monte Carlo Simulation of GaN Submicron n+-n-n+ Diode with AlGaN Heterojunction Cathode

机译:AlGaN异质结阴极对GaN亚微米n + -n-n +二极管的蒙特卡罗模拟

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摘要

An ensemble Monte Carlo simulation has been developed to simulate the motion of electrons in a submicron GaN diode with a AlxGa1-xN heterojunction cathode. It is shown that the hot electron injection through the heterojunction cathode is effective to increase the mean electron velocity of carriers. The analysis has also shown that the mean drift velocity for electrons in the channel is about 2x105 m sec-1 at bias 4 V. Mean drift velocity in channel decrease with temperature and reach to saturated value about 1.5x105 m sec-1.
机译:已经开发了整体蒙特卡罗模拟,以模拟具有AlxGa1-xN异质结阴极的亚微米GaN二极管中电子的运动。结果表明,通过异质结阴极注入热电子可有效提高载流子的平均电子速度。分析还表明,在偏压为4 V的情况下,通道中电子的平均漂移速度约为2x105 m sec-1。通道中的平均漂移速度随温度降低,并达到约1.5x105 m sec-1的饱和值。

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