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Schottky Barriers on Layered Anisotropic Semiconductor – WSe2 – with 1000 ? Indium Metal Thickness

机译:层状各向异性半导体– WSe2 –上的肖特基势垒为1000?铟金属厚度

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We have studied the forward I-V characteristics of In-pWSe2Schottky barrier diode with 1000 ? indium thickness in the temperature range 140 – 300 K well within the domain of thermionic emission theory with Gaussian distribution of barrier height. However we found some anomalies in the low temperature range below 200 K. Hence we have considered a model that incorporates thermionic emission, generation recombination and tunneling components. The low temperature anomalies observed in the diode parameters were effectively construed in terms of the contribution of these multiple charge transport mechanisms across the interface of the fabricated diodes. Various Schottky diode parameters were also extracted and compared with that of 500 ? metal thickness In-pWSe2 diode.
机译:我们已经研究了In-pWSe2肖特基势垒二极管具有1000Ω的正向I-V特性。铟厚度在140 – 300 K的温度范围内,处于热电子发射理论的范围之内,且势垒高度具有高斯分布。但是,我们在200 K以下的低温范围内发现了一些异常情况。因此,我们考虑了一个包含热电子发射,生成重组和隧穿分量的模型。根据跨制造二极管界面的这些多种电荷传输机制的贡献,可以有效地解释在二极管参数中观察到的低温异常。还提取了各种肖特基二极管参数,并将其与500?金属厚度In-pWSe2二极管。

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