...
首页> 外文期刊>Journal of Physics. Condensed Matter >Tuning the p-type Schottky barrier in 2D metal/semiconductor interface: boron-sheet on MoSe2, and WSe2
【24h】

Tuning the p-type Schottky barrier in 2D metal/semiconductor interface: boron-sheet on MoSe2, and WSe2

机译:在2D金属/半导体界面中调整P型肖特基屏障:MOSE2和WSE2上的硼 - 纸张

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Van der Waals (vdW) metal/semiconductor heterostructures have been investigated through first-principles calculations. We have considered the recently synthesized borophene (Mannix et al 2015 Science 350 1513), and the planar boron sheets (S1 and S2) (Feng et al 2016 Nat. Chem. 8 563) as the 2D metal layer, and the transition metal dichalcogenides (TMDCs) MoSe2, and WSe2 as the semiconductor monolayer. We find that the energetic stability of those 2D metal/semiconductor heterojunctions is mostly ruled by the vdW interactions; however, chemical interactions also take place in borophene/TMDC. The electronic charge transfer at the metal/semiconductor interface has been mapped, where we find a a net charge transfer from the TMDCs to the boron sheets. Further electronic structure calculations reveal that the metal/semiconductor interfaces, composed by planar boron sheets S1 and S2, present a p-type Schottky barrier which can be tuned to a p-type ohmic contact by an external electric field.
机译:通过第一原理计算研究了范德华(VDW)金属/半导体异质结构。 我们已经考虑了最近合成的博罗琳(Mannix等,2015年Science 350 1513),以及平面硼板(S1和S2)(Feng等,2016 Nat。Chem.8 563)作为2D金属层,和过渡金属二均磷脂 (TMDCS)MOSE2和WSE2作为半导体单层。 我们发现,那些2D金属/半导体异质结的能量稳定性主要由VDW相互作用统治; 然而,化学相互作用也发生在硼酮/ TMDC中。 金属/半导体界面处的电子电荷转移已被映射,在那里我们发现从TMDCS到硼板的净电荷转移。 进一步的电子结构计算表明,由平面硼板S1和S2组成的金属/半导体界面呈现P型肖特基屏障,其可以通过外部电场调谐到P型欧姆接触。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号