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Carbon-Related Defects as a Source for the Enhancement of Yellow Luminescence of Unintentionally Doped GaN

机译:碳相关缺陷作为无意掺杂GaN增强黄色发光的来源

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Yellow luminescence (YL) of unintentionally doped GaN (u-GaN) peaking at about 2.2 eV has been investigated for decades, but its origin still remains controversial. In this study, ten u-GaN samples grown via metalorganic chemical vapor deposition (MOCVD) are investigated. It is observed from the room temperature (RT) photoluminescence (PL) measurements that the YL band is enhanced in the PL spectra of those samples if their MOCVD growth is carried out with a decrease of pressure, temperature, or flow rate of NH 3 . Furthermore, a strong dependence of YL band intensity on the carbon concentration is found by secondary ion mass spectroscopy (SIMS) measurements, demonstrating that the increased carbon-related defects in these samples are responsible for the enhancement of the YL band.
机译:数十年来研究了无意识掺杂的GaN(u-GaN)峰值约为2.2 eV的黄光(YL),但其起源仍然有争议。在这项研究中,研究了十个通过金属有机化学气相沉积(MOCVD)生长的u-GaN样品。从室温(RT)光致发光(PL)测量可以观察到,如果在压力,温度或NH 3流量降低的情况下进行MOCVD生长,则这些样品的PL光谱中的YL带会增强。此外,通过二次离子质谱(SIMS)测量发现YL谱带强度对碳浓度有很强的依赖性,表明这些样品中与碳有关的缺陷增加是YL谱带增强的原因。

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