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Effect of Metal-Semiconductor Contact Geometry on Electrical Properties of Al/ZnSe Thin Films

机译:金属-半导体接触几何形状对Al / ZnSe薄膜电性能的影响

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摘要

The desire for smaller, more efficient and faster semiconductor devices has made design of metal-semiconductor contacts and characterization very vital. There is little research if any on the effect of metal-semiconductor contact geometry on I-V characteristics of ZnSe thin films. Various circular and rectangular thin filmed Al/ZnSe devices were designed by varying the shape and area of the Aluminium metal contact. Fabrication was done by thermal vacuum evaporation technique of zinc (99.99%) and selenium (99.99%) alloy powder onto masked glass slides using an Edward Auto 306 RF/DC magnetron evaporation chamber. Aluminium metal was subsequently deposited on the ZnSe thin films using circular and rectangular masks. Silver paste was used as the ohmic contacts. I-V characteristics were obtained using the Keithley 2400 source meter and data analyzed using Origin Software. From the J-V characteristic curves, the dark diode ideality factors ranged between 6.0 and 7.3 and were lower for circular Schottky devices than for rectangular ones. Device with circular Schottky contact area of 2.0423×10~(-4)m~(2); a smaller inter-electrode spacing of 4mm had the lowest diode ideality factor of 6.361.
机译:对更小,更高效和更快的半导体器件的需求使得金属-半导体触点的设计和表征变得至关重要。几乎没有关于金属-半导体接触几何形状对ZnSe薄膜的I-V特性的影响的研究。通过改变铝金属触点的形状和面积,设计了各种圆形和矩形的薄膜Al / ZnSe器件。使用Edward Auto 306 RF / DC磁控管蒸发室,通过热真空蒸发技术将锌(99.99%)和硒(99.99%)合金粉进行热加工到蒙版玻璃载玻片上。随后使用圆形和矩形掩模将铝金属沉积在ZnSe薄膜上。银浆用作欧姆接触。使用Keithley 2400源表获得I-V特性,并使用Origin Software分析数据。从J-V特性曲线来看,圆形肖特基器件的暗二极管理想因子在6.0到7.3之间,比矩形器件低。圆形肖特基接触面积为2.0423×10〜(-4)m〜(2)的器件;较小的电极间间距4mm具有最低的二极管理想系数6.361。

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