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首页> 外文期刊>Materials Research >Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use
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Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use

机译:脉冲等离子磁控溅射(Pdms)在户外用高压陶瓷绝缘子上沉积的纳米结构钛膜

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In this study, the cold plasma technique was used to produce nanometric titanium films with hydrophobic and anti-fouling properties. The films where deposited on porcelain electrical insulators surfaces to minimize the effects of leakage current. The magnetron sputtering technique was used with a target of pure titanium sheet, and argon as the ionization gas. The deposited films present an average thickness of 58 to 350 nm. After coating the insulators, the assays performed indicated a greater degree of hydrophobicity and maintenance of leakage current after exposure to salt spray. Lower leakage current values were observed in both natural and saline environments compared with the uncoated device.
机译:在这项研究中,冷等离子体技术被用于生产具有疏水和防污性能的纳米钛膜。薄膜沉积在瓷电绝缘体表面上,以最大程度地减小漏电流的影响。使用磁控溅射技术,靶材为纯钛片,氩气为电离气体。沉积膜的平均厚度为58至350 nm。涂覆绝缘体后,进行的测定表明,在暴露于盐雾后,疏水性更高,并且维持漏电流。与未涂覆的设备相比,在自然和盐水环境中均观察到较低的漏电流值。

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