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Effects of annealing on electrical and optical properties of a multilayer InAs/GaAs quantum dots system

机译:退火对多层InAs / GaAs量子点系统电学和光学性能的影响

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A systematic investigation of the properties of the InAs/GaAs self-assembled quantum dots (SAQDs) system subjected to a post-growth annealing using capacitance-voltage, Raman scattering and photoluminescence measurements is presented. The application of both electrical and optical methods allowed us to obtain reliable information on the microscopic structural evolution of this system. The single layer and the multilayer quantum dots were found to respond differently to the annealing process, due to the differences in strain that occur in both systems. The diffusion activated by strain provoked the appearance of an InGaAs alloy layer in substitution to the quantum dots layers; this change occurred at the annealing temperature T = 600 oC in the multilayer system. A single dot layer, however, was observed even after the annealing at T = 700 oC. Moreover, the low temperature annealing was found to improve the homogeneity of the multilayer system and to decrease the electrical interlayer coupling.
机译:进行了系统的研究的InAs / GaAs自组装量子点(SAQDs)系统的性能进行了后生长退火使用电容电压,拉曼散射和光致发光测量。电气和光学方法的应用使我们能够获得有关该系统微观结构演变的可靠信息。由于这两个系统中发生的应变差异,发现单层和多层量子点对退火过程的响应不同。由应变激活的扩散引起了代替量子点层的InGaAs合金层的出现。这种变化发生在多层系统中的退火温度T = 600 oC时。但是,即使在T = 700 oC退火后,仍观察到单点层。此外,发现低温退火改善了多层系统的均匀性并降低了电层间耦合。

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