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Optical and Electrical Transport Properties of Transition Metal Dichalcogenide MoSe2 Thin Films

机译:过渡金属二硫属元素化物MoSe2薄膜的光电传输特性

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The transition metal dichalcogenide, MoSe2 thin films were deposited on glass and stainless steel substrates by using Arrested Precipitation Technique. The reaction between MoO3, TEA, Sodium dithionate and Sodium selenosulphate in an aqueous alkaline medium at 333 K has been used for synthesis. The deposited thin films have been characterized by using optical absorption, x-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive x-ray analysis (EDAX), atomic force microscopy (AFM),and electrical transport properties.The optical absorption study shows direct transition having band gap of 1.76 eV. The x-ray diffraction study reveals that the films are polycrystalline with hexagonal crystal structure. The electrical transport property studies revealed that the temperature dependence of an electrical conductivity has a distinct conduction region. The thermoelectric power measurements showed that the thermally generated voltage was of the order of several microvolts and exhibited n-type conduction. The surface morphology study by SEM and AFM shows that the grains are uniformly distributed over the entire surface and the deposition is uniform, compact and pin hole free.EDAX study reveals the stoichiometric nature of the films.
机译:通过使用捕集沉淀技术在玻璃和不锈钢基板上沉积了过渡金属二卤化钼MoSe2薄膜。 MoO3,TEA,二硫代硫酸钠和硒代硫酸钠在含水碱性介质中在333 K下的反应已用于合成。通过使用光吸收,X射线衍射(XRD),扫描电子显微镜(SEM),能量色散X射线分析(EDAX),原子力显微镜(AFM)和电传输特性来表征沉积的薄膜。光吸收研究显示带隙为1.76 eV的直接跃迁。 X射线衍射研究表明该膜是具有六方晶体结构的多晶。电传输性能研究表明,电导率的温度依赖性具有明显的导电区域。热电功率测量表明,热产生的电压约为几微伏,并且表现出n型传导。 SEM和AFM的表面形貌研究表明,晶粒均匀地分布在整个表面上,沉积均匀,致密且无针孔。EDAX研究揭示了薄膜的化学计量性质。

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