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首页> 外文期刊>Archives of Physics Research >Oxidation temperature and vapor chopping effects on superficial properties of Bi2O3 thin film prepared on glass and aluminasubstrates
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Oxidation temperature and vapor chopping effects on superficial properties of Bi2O3 thin film prepared on glass and aluminasubstrates

机译:氧化温度和蒸气斩波对在玻璃和氧化铝基底上制备的Bi2O3薄膜的表面性能的影响

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The nanoscale bismuth oxide thin films prepared by thermal oxidation (in air) of vacuum evaporated vapor chopped and nonchopped bismuth metal thin films on crystalline alumina and amorphous glass substrates. The effect of substrate nature on the structural, surface morphological, contact angle, electrical resistivity and adhesion properties of Bi2O3 thin films were studied. It is found that the substrate effect was prominently manifested in the surface morphology. Effect of oxidation temperature on thin films properties was also investigated. The surface roughness of deposited Bi2O3 thin films were found to increase on glass while it reduced on alumina with increase in oxidation temperatures. All the films showed hydrophilic nature. Contact angle was found to decrease with increase in surface roughness in all cases. Adhesion, crystallinity and grain size of bismuth oxide films on alumina substrate was found to be higher than in the case of Bi2O3 thin films deposited on glass. Vapor chopped thin films showed higher adhesion, smaller grain size, higher contact angle, lower resistivity and smooth surface morphology.
机译:纳米级氧化铋薄膜是通过在晶体氧化铝和无定形玻璃基板上真空蒸发汽化的,切碎的和未切碎的铋金属薄膜进行热氧化(在空气中)制得的。研究了基材性质对Bi2O3薄膜的结构,表面形态,接触角,电阻率和粘附性能的影响。发现底物效应在表面形态中显着地表现出来。还研究了氧化温度对薄膜性能的影响。发现随着氧化温度的升高,沉积的Bi2O3薄膜的表面粗糙度在玻璃上会增加,而在氧化铝上会降低。所有膜均显示出亲水性。发现在所有情况下接触角都随着表面粗糙度的增加而减小。发现与在玻璃上沉积Bi 2 O 3薄膜的情况相比,氧化铝基底上的氧化铋膜的粘附性,结晶度和晶粒尺寸更高。蒸气切碎的薄膜表现出更高的粘附性,更小的晶粒尺寸,更高的接触角,更低的电阻率和光滑的表面形态。

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