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Fabrication of highly L10-ordered FePt thin films by low-temperature rapid thermal annealing

机译:低温快速热退火制备高L10级FePt薄膜

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Highly L10-ordered FePt thin films with a strong (001) texture were successfully fabricated on amorphous substrates simply by co-sputtering and rapid thermal annealing at a low temperature of 400?°C. The morphology of FePt thin films depended strongly on the heating rate, changing from a continuous structure with an atomically flat surface to an island-like structure. The change of the morphology resulted in a drastic increase of coercivity, indicating that the magnetization process could be controlled by the heating condition. This fabrication method of ordered FePt thin films is favorable in view of the compatibility for a practical device fabrication process.
机译:只需在400?C的低温下通过共溅射和快速热退火,就可以在非晶衬底上成功制备出具有高强度(001)结构的高L10级FePt薄膜。 FePt薄膜的形态在很大程度上取决于加热速率,从具有原子平面的连续结构变为岛状结构。形态的变化导致矫顽力的急剧增加,表明磁化过程可以通过加热条件来控制。考虑到与实际器件制造工艺的兼容性,这种有序的FePt薄膜的制造方法是有利的。

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