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Growth of Ga 2 O 3 Nanowires via Cu-As-Ga Ternary Phase Diagram

机译:通过Cu-As-Ga三元相图生长Ga 2 O 3纳米线

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Currently, it is challenging to develop new catalysts for semiconductor nanowires (NWs) growth in a complementary-metal-oxide-semiconductor (CMOS) compatible manner via a vapor-liquid-solid (VLS) mechanism. In this study, chemically synthesized Cu 2 O nano cubes are adopted as the catalyst for single crystalline β-Ga 2 O 3 NWs growth in chemical vapor deposition. The growth temperature is optimized to be 750 to 800 °C. The NW diameter is controlled by tuning the sizes of Cu 2 O cubes in the 20 to 100 nm range with a bandgap of ~4.85 eV as measured by ultraviolet-visible absorption spectroscopy. More importantly, the catalyst tip is found to be Cu 5 As 2 , which is distinguished from those Au-catalyzed Au-Ga alloys. After a comprehensive phase diagram investigation, the β-Ga 2 O 3 NWs are proposed to be grown by the ternary phase of Cu-As-Ga diffusing Ga into the growth frontier of the NW, where Ga react with residual oxygen to form the NWs. Afterward, Ga diminishes after growth since Ga would be the smallest component in the ternary alloy. All these results show the importance of the catalyst choice for CMOS compatible NW growth and also the potency of the ternary phase catalyst growth mode in other semiconductor NWs synthesis.
机译:当前,挑战性的是通过气-液-固(VLS)机制以互补金属氧化物半导体(CMOS)兼容的方式开发用于半导体纳米线(NWs)生长的新催化剂。在这项研究中,采用化学合成的Cu 2 O纳米立方作为化学气相沉积中单晶β-Ga2 O 3 NWs生长的催化剂。生长温度最优化为750至800°C。通过在20至100 nm范围内调整Cu 2 O立方体的大小来控制NW直径,通过紫外可见吸收光谱法测得其带隙为〜4.85 eV。更重要的是,发现催化剂尖端为Cu 5 As 2,与那些Au催化的Au-Ga合金不同。经过全面的相图研究后,建议通过将Cu-As-Ga的三元相扩散Ga到NW的生长前沿来生长β-Ga2 O 3 NW,其中Ga与残余氧反应形成NWs 。之后,由于Ga将是三元合金中的最小组分,因此Ga在生长后减小。所有这些结果表明,选择催化剂对于兼容CMOS的NW生长以及在其他半导体NW合成中三元催化剂生长模式的效力也很重要。

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