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Preparation and Photoluminescence of Tungsten Disulfide Monolayer

机译:二硫化钨单层的制备与光致发光

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Tungsten disulfide (WS2) monolayer is a direct band gap semiconductor. The growth of WS2 monolayer hinders the progress of its investigation. In this paper, we prepared the WS2 monolayer through chemical vapor transport deposition. This method makes it easier for the growth of WS2 monolayer through the heterogeneous nucleation-and-growth process. The crystal defects introduced by the heterogeneous nucleation could promote the photoluminescence (PL) emission. We observed the strong photoluminescence emission in the WS2 monolayer, as well as thermal quenching, and the PL energy redshift as the temperature increases. We attribute the thermal quenching to the energy or charge transfer of the excitons. The redshift is related to the dipole moment of WS2.
机译:二硫化钨(WS2)单层是直接带隙半导体。 WS2单层的增长阻碍了其研究的进展。在本文中,我们通过化学气相传输沉积制备了WS2单层。通过异质成核和生长过程,此方法使WS2单层的生长更容易。由异质成核引入的晶体缺陷可以促进光致发光(PL)发射。我们观察到WS2单层中强烈的光致发光发射以及热猝灭,并且PL能量随温度升高而红移。我们将热猝灭归因于激子的能量或电荷转移。红移与WS2的偶极矩有关。

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