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Microstructure and Properties of CrAlSiN Coatings Deposited by HiPIMS and Direct-Current Magnetron Sputtering

机译:HiPIMS和直流磁控溅射沉积CrAlSiN涂层的组织和性能

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Four CrAlSiN coatings with different Al contents were prepared by varying Al sputtering power using a combined method of high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS). Microstructure, chemical compositions and mechanical properties of the four coatings were characterized by XRD, XPS, SEM, TEM, nano-indentation etc. Results showed that the four coatings possessed face-centered cubic (fcc) CrN phase with Al and part of Si dissolved in it. Another part of Si existed as amorphous phase in the coatings. All the four coatings had columnar structure and formed in epitaxy growth by template effect. With increasing Al sputtering power, the Al content increased from 11.4 to 17.6 at.% gradually, while the Cr content decreased a little. The hardness of the CrAlSiN coatings increased initially probably due to the refinement of the coating grain size, while it decreased afterwards mainly caused by the aggregation of small particles leading to rougher surface and defects formed in the coatings. The elastic modulus and adhesive strength possessed the same variation tendency as the hardness versus Al sputtering power. The CrAlSiN coating with Al sputtering power of about 0.8 kW had the highest hardness of about 26.7 GPa and adhesive strength of about 27.2 N.
机译:通过使用高功率脉冲磁控溅射(HiPIMS)和直流磁控溅射(DCMS)的组合方法,通过改变Al的溅射功率来制备四种具有不同Al含量的CrAlSiN涂层。通过XRD,XPS,SEM,TEM,纳米压痕等手段对四种涂层的组织,化学组成和力学性能进行了表征。结果表明,四种涂层具有面心立方CrN相,Al和部分Si溶解。在里面。 Si的另一部分作为非晶态相存在于涂层中。四种涂层均具有柱状结构,并通过模板效应在外延生长中形成。随着Al溅射功率的增加,Al含量从11.4at。%逐渐增加,而Cr含量略有下降。 CrAlSiN涂层的硬度最初可能由于涂层晶粒尺寸的细化而增加,而之后又下降,主要是由于小颗粒的聚集导致表面更粗糙以及涂层中形成缺陷所致。弹性模量和粘合强度具有与硬度相对于Al溅射能力相同的变化趋势。具有约0.8kW的Al溅射功率的CrAlSiN涂层具有约26.7GPa的最高硬度和约27.2N的粘合强度。

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