首页> 外文期刊>Brazilian Oral Research >Influence of photo-activation source on enamel demineralization around restorative materials
【24h】

Influence of photo-activation source on enamel demineralization around restorative materials

机译:光活化源对修复材料周围牙釉质脱盐的影响

获取原文
           

摘要

This study evaluated the effects of the photoactivation source and restorative material on the development of caries-like lesions on human enamel after an in vitro pH challenge. Enamel cavities were prepared in 36 blocks, which were assigned to two groups according to the restorative material: resin-modified glass ionomer (RMGI) and composite resin (CR). Samples were exposed to quartz-tungsten-halogen lamp, argon-ion laser, or light-emitting diode (n = 6). The Knoop microhardness (KHN) values of the top surface of all materials were evaluated. Restored enamel blocks were thermocycled and subjected to 10 demineralization-remineralization cycles at 37°C. KHN analysis of the superficial enamel was performed by four indentations located 100 mm from the restoration margin. The material KHN was not affected by the photoactivation source. No significant difference in KHN was noted between CR and RMGI. The enamel surface around RMGI exhibited a higher KHN (272.8 KHN) than the enamel around CR (93.3 KHN), regardless of the photoactivation source. Enamel demineralization around the dental restoration was not influenced by the photoactivation source. Less enamel demineralization was observed around the RMGI than around the CR restoration.
机译:这项研究评估了在体外pH挑战后,光活化源和修复材料对人牙釉质上龋齿样病变发展的影响。搪瓷模腔分为36个块,根据修复材料分为两组:树脂改性的玻璃离聚物(RMGI)和复合树脂(CR)。将样品暴露于石英钨卤素灯,氩离子激光器或发光二极管(n = 6)下。评价所有材料的顶表面的努氏显微硬度(KHN)值。将恢复的瓷釉块进行热循环,并在37°C下进行10次脱矿质-再矿化循环。通过距修复边缘100毫米的四个压痕对表面釉质进行KHN分析。物质KHN不受光活化源的影响。 CR和RMGI之间的KHN没有显着差异。不管光激活源如何,RMGI周围的瓷釉表面均显示出比CR周围的瓷釉(93.3 KHN)高的KHN(272.8 KHN)。牙修复体周围的牙釉质脱矿不受光活化源的影响。在RMGI周围观察到的牙釉质脱矿少于CR修复周围。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号